Dynaloy: Photoresist Strippers, Flux Removers, Stencil Cleaners, Microelectronics Cleaners, Urethane Solvents, Epoxy Solvents

DYNALOY NEWS

FOR IMMEDIATE RELEASE
Dynaloy Welcomes Dr. Daoji Gan and Dr. Kimberly Pollard to Research and Development Team


On February 14, 2005, Dynaloy LLC welcomed Dr. Daoji Gan and Dr. Kimberly Pollard to our research and development team.  The team is charged with leading product development for the creation of novel products to add to our premier product set. 

Dr. Gan has a Ph.D. in synthetic polymer chemistry. For the past two years, he has worked in the development of new photoresist materials for microelectronic / semiconductor industrial applications. His background also includes organic synthesis, nanoparticles, colloids, and smart composite materials.

Dr. Pollard has a Ph.D. in inorganic chemistry and materials science.  Prior to joining Dynaloy, she worked in a research and development group fabricating sensors using traditional semiconductor processing and MEMS techniques.  Dr. Pollard's background includes organometallic synthesis, fluorescent nanocrystal synthesis, as well as film deposition techniques including electroplating, physical vapor deposition (PVD), chemical vapor deposition (CVD) and chemical mechanical planarization (CMP).

We feel that their experience and training will be very beneficial as we continue to grow and develop our business. 

Welcome aboard!

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