Dynaloy: Photoresist Strippers, Flux Removers, Stencil Cleaners, Microelectronics Cleaners, Urethane Solvents, Epoxy Solvents

DYNALOY NEWS

FOR IMMEDIATE RELEASE
Dynaloy™, LLC announces the installation of the Helios NanoLab SEM/FIB
from FEI in its Development and Applications lab.

Indianapolis, IN, May 12, 2009 - Dynaloy™, LLC is enjoying success and investing for the future. Dynaloy's Development and Applications lab moves forward with the addition of the Helios NanoLab from FEI. High resolution SEM images and cross-sectioning ability are critical for providing semiconductor customers visual data to validate the effectiveness of Dynaloy's removers and cleaning solutions.

This month Dynaloy qualified a new scanning electron microscope (SEM). "Installing the FEI Helios NanoLab advances our surface analysis capabilities to best-in-class service in order to improve cycle time for developing new solutions for the semiconductor industry. Cleaning of process residue and removal of photoresist is needed in order to manufacture the finest lines at the sub 32 nanometer node,&quote; said Dr. Kimberly Pollard, PhD, Director of Technology, Dynaloy LLC. "This high performance tool allows us to move faster in commercializing OneStep™ technology in our core IC packaging business as well as the advanced technology business for BEOL and FEOL. We get immediate feedback through visualization of cleaning and material compatibility,"e; said Dr. Pollard.

"From high volume 3-D cross-sectional imaging and analysis to advanced high-resolution STEM imaging, the Helios NanoLab family offers solutions to meet the rigorous demands of semiconductor characterization and analysis labs," said Tony Edwards, vice president and general manager of FEI's NanoElectronics business. "The Helios NanoLab system represent FEI's continued lead in innovating combined FIB/SEM solutions and we look forward to engaging with Dynaloy to assist in characterizing and ramping the key products that they provide to the semiconductor industry."

FEI Helios Technology

Combining advanced focused ion beam (FIB) and scanning electron microscope (SEM) technologies in a highly-integrated and easy-to-use platform, the Helios NanoLab family of tools provides semiconductor manufacturers with a complete range of advanced high-resolution solutions for their analytical labs. As with all FEI products for semiconductor manufacturers, the Helios NanoLab systems are designed to help semiconductor and research companies move through their design and process ramps quickly and with more efficiency, enabling them to move new products to market faster.

Dynaloy™, LLC

Today Dynaloy™, LLC is working with many of the worlds major semiconductor manufacturers to provide for tomorrow's advance chips used in cell phones, desktops, wireless networks, servers and electronic entertainment. Through their enabling technologies, Dynaloy's product portfolio provides semiconductor manufacturers with a complete range of removal solutions for a variety of pattern transfer stacks.

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